EUV Light Source Technology & Development Program Intern

ASML US brings together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world's leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, the Netherlands, and we have 18 office locations around the United States including main offices in Chandler Arizona, San Jose and San Diego California, Wilton Connecticut, and Hillsboro Oregon.

As the world's leadingsemiconductor lithography machine (the machine that makes computer chips)manufacturer, ASML enables chip manufacturers to make cheaper, faster chips,thereby enabling all the technology you use today. The machines we make requirehigh speed, magnetically levitated stages with sub-nanometer accuracy, roboticmask delivery systems, mechatronic devices to shape and correct the laserillumination source, and optical modules that can detect sub-nanometer alignmenterrors and pattern distortions. Temperature controlled to milli-kelvins,particulate free, and operating in complete vacuum, the technical challengesare endless. Solving these challenges requires expertise in servo controls,mechatronics, mechanical engineering, electrical engineering, embedded softwareengineering, optics, physics, manufacturing, industrialization, and more. Ifyou like extreme challenges and want to help bring the next generation oftechnology to the world, then come join ASML.

This position requires access to controlledtechnology, as defined in the Export Administration Regulations (15 C.F.R. *730, et seq.). Qualified candidates must be legally authorized to access suchcontrolled technology prior to beginning work. Business demands may requireASML to proceed with applicants who are immediately eligible to accesscontrolled technology.

Internship Goals and Objectives:

• Work in a team environment alongside local experienced engineers.
• Specific tasks will be tailored to match the education / experience level of the intern as well as the interns learning objectives for the summer.
• The 2020 project will assist in design and performance characterization of higher energy density, high average power EUV source. The intern will participate in the lab and gain experience analyzing data from various measurements and with different metrologies.
• The goal of the internship is for you to learn about working in a corporate setting and to provide hands on experience solving real world problems in a team environment.
• Interns will typically be required to document and present their findings as well as making an end of summer presentation to the group about what they achieved during their internship.

• Current active students in Engineering or Physics with knowledge of lasers or plasma with a GPA of 3.0 or above.

• Possess strong ownership characteristics and commitment to achieving results on time
• Have strong English written and oral communicative skills
• Be a demonstrated "team player" with a quality orientation and interpersonal skills
• Have strong problem solving skills and the ability to take initiative
• Be willing to be "wrong" at times and be open to the ideas of others

• Relocation assistance and/or housing is not provided for these internships.

EOE AA M/F/Veteran/Disability